2007
Mehta, Alok A; Rumpf, Raymond C; Roth, Zachary A; Johnson, Eric G
Guided mode resonance filter as a spectrally selective feedback element in a double-cladding optical fiber laser Journal Article
In: IEEE Photonics Technology Letters, 19 (24), pp. 2030-2032, 2007, ISSN: 1041-1135.
Abstract | Links | BibTeX | Tags: gratings, lasers, optical fiber, optical resonance
@article{RN27,
title = {Guided mode resonance filter as a spectrally selective feedback element in a double-cladding optical fiber laser},
author = {Alok A Mehta and Raymond C Rumpf and Zachary A Roth and Eric G Johnson},
url = {https://ieeexplore.ieee.org/document/4390072},
doi = {10.1109/LPT.2007.908776},
issn = {1041-1135},
year = {2007},
date = {2007-11-27},
journal = {IEEE Photonics Technology Letters},
volume = {19},
number = {24},
pages = {2030-2032},
abstract = {In this work, a spectrally selective optical element is introduced based on a 2-D guided mode resonance filter (GMRF) as an external feedback element. The GMRF was designed to provide a highly efficient narrow linewidth reflection within the gain bandwidth of the fiber laser, while transmitting the pump beam. These features enabled the fiber laser to operate in an external cavity configuration to provide a wavelength-stabilized and narrow linewidth output within the optical -band.},
keywords = {gratings, lasers, optical fiber, optical resonance},
pubstate = {published},
tppubtype = {article}
}
In this work, a spectrally selective optical element is introduced based on a 2-D guided mode resonance filter (GMRF) as an external feedback element. The GMRF was designed to provide a highly efficient narrow linewidth reflection within the gain bandwidth of the fiber laser, while transmitting the pump beam. These features enabled the fiber laser to operate in an external cavity configuration to provide a wavelength-stabilized and narrow linewidth output within the optical -band.
Rumpf, Raymond C; Mehta, Alok; Srinivasan, Pradeep; Johnson, Eric G
Design and optimization of space-variant photonic crystal filters Journal Article
In: Applied optics, 46 (23), pp. 5755-5761, 2007, ISSN: 1539-4522.
Abstract | Links | BibTeX | Tags: Effective refractive index, space-variant photonic crystal
@article{RN35,
title = {Design and optimization of space-variant photonic crystal filters},
author = {Raymond C Rumpf and Alok Mehta and Pradeep Srinivasan and Eric G Johnson},
url = {https://www.osapublishing.org/ao/abstract.cfm?uri=ao-46-23-5755},
doi = {https://doi.org/10.1364/AO.46.005755},
issn = {1539-4522},
year = {2007},
date = {2007-06-01},
journal = {Applied optics},
volume = {46},
number = {23},
pages = {5755-5761},
abstract = {A space-variant photonic crystal filter is designed and optimized that may be placed over a detector array to perform filtering functions tuned for each pixel. The photonic crystal is formed by etching arrays of holes through a multilayer stack of alternating high and low refractive index materials. Position of a narrow transmission notch within a wide reflection band is varied across the device aperture by adjusting the diameter of the holes. Numerical simulations are used to design and optimize the geometry of the photonic crystal. As a result of physics inherent in the etching process, the diameter of the holes reduces with depth, producing a taper. Optical performance was found to be sensitive to the taper, but a method for compensation was developed where film thickness is varied through the device.},
keywords = {Effective refractive index, space-variant photonic crystal},
pubstate = {published},
tppubtype = {article}
}
A space-variant photonic crystal filter is designed and optimized that may be placed over a detector array to perform filtering functions tuned for each pixel. The photonic crystal is formed by etching arrays of holes through a multilayer stack of alternating high and low refractive index materials. Position of a narrow transmission notch within a wide reflection band is varied across the device aperture by adjusting the diameter of the holes. Numerical simulations are used to design and optimize the geometry of the photonic crystal. As a result of physics inherent in the etching process, the diameter of the holes reduces with depth, producing a taper. Optical performance was found to be sensitive to the taper, but a method for compensation was developed where film thickness is varied through the device.
Mehta, Alok; Brown, Jeremiah D; Srinivasan, Pradeep; Rumpf, Raymond C; Johnson, Eric G
Spatially polarizing autocloned elements Journal Article
In: Optics Letters, 32 (13), pp. 1935-1937, 2007, ISSN: 1539-4794.
Abstract | Links | BibTeX | Tags: birefringent grating, spatially-variant polarization
@article{RN24,
title = {Spatially polarizing autocloned elements},
author = {Alok Mehta and Jeremiah D Brown and Pradeep Srinivasan and Raymond C Rumpf and Eric G Johnson},
url = {https://www.osapublishing.org/ol/abstract.cfm?uri=ol-32-13-1935},
doi = {https://doi.org/10.1364/OL.32.001935},
issn = {1539-4794},
year = {2007},
date = {2007-05-01},
journal = {Optics Letters},
volume = {32},
number = {13},
pages = {1935-1937},
abstract = {A space-variant polarization converting element is introduced that utilizes an autocloning effect to produce high aspect ratio from birefringent gratings. This method utilizes a multilayer deposition process on a template to convert a linearly polarized incident beam to an azimuthally polarized output at a wavelength of 1.55 micrometers with more than 90% efficiency.},
keywords = {birefringent grating, spatially-variant polarization},
pubstate = {published},
tppubtype = {article}
}
A space-variant polarization converting element is introduced that utilizes an autocloning effect to produce high aspect ratio from birefringent gratings. This method utilizes a multilayer deposition process on a template to convert a linearly polarized incident beam to an azimuthally polarized output at a wavelength of 1.55 micrometers with more than 90% efficiency.
Rumpf, Raymond Charles
Fiber optic temperature sensor PhD Thesis
2007.
@phdthesis{RN58,
title = {Fiber optic temperature sensor},
author = {Raymond Charles Rumpf},
url = {https://catalog.lib.fit.edu/Record/158862},
year = {2007},
date = {2007-05-01},
keywords = {},
pubstate = {published},
tppubtype = {phdthesis}
}
Mehta, Alok; Rumpf, Raymond C; Roth, Zachary A; Johnson, Eric G
Erbium-Ytterbium Doped Double Cladding Optical Fiber Laser Utilizing a Guided Mode Resonance Filter as an External Feedback Element Journal Article
In: IEEE Photonics Tech Letters, 19 (24), pp. 2030-2032, 2007.
BibTeX | Tags:
@article{RN37,
title = {Erbium-Ytterbium Doped Double Cladding Optical Fiber Laser Utilizing a Guided Mode Resonance Filter as an External Feedback Element},
author = {Alok Mehta and Raymond C Rumpf and Zachary A Roth and Eric G Johnson},
year = {2007},
date = {2007-04-01},
journal = {IEEE Photonics Tech Letters},
volume = {19},
number = {24},
pages = {2030-2032},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
Rumpf, Raymond C; Johnson, Eric G
Modeling fabrication to accurately place GMR resonances Journal Article
In: Optics Express, 15 (6), pp. 3452-3464, 2007, ISSN: 1094-4087.
Abstract | Links | BibTeX | Tags: depostion processes, electromagnetic modeling, etching, GMR, guided mode resonance (GMR), numerical simulation, thin film resistors
@article{RN29,
title = {Modeling fabrication to accurately place GMR resonances},
author = {Raymond C Rumpf and Eric G Johnson},
url = {https://www.osapublishing.org/oe/fulltext.cfm?uri=oe-15-6-3452&id=131206},
doi = {https://doi.org/10.1364/OE.15.003452},
issn = {1094-4087},
year = {2007},
date = {2007-04-01},
journal = {Optics Express},
volume = {15},
number = {6},
pages = {3452-3464},
abstract = {Numerical methods for simulating etching and deposition processes were combined with electromagnetic modeling to design guided-mode resonance (GMR) filters with accurately positioned resonances and study how fabrication affects their optical behavior. GMR filters are highly sensitive to structural deformations that arise during fabrication, making accurate placement of their resonances very difficult without active tuning while in operation. Inspired by how thin film resistors are trimmed during fabrication, the numerical tools were used to design a method for adjusting position of GMR resonances at the time of fabrication.},
keywords = {depostion processes, electromagnetic modeling, etching, GMR, guided mode resonance (GMR), numerical simulation, thin film resistors},
pubstate = {published},
tppubtype = {article}
}
Numerical methods for simulating etching and deposition processes were combined with electromagnetic modeling to design guided-mode resonance (GMR) filters with accurately positioned resonances and study how fabrication affects their optical behavior. GMR filters are highly sensitive to structural deformations that arise during fabrication, making accurate placement of their resonances very difficult without active tuning while in operation. Inspired by how thin film resistors are trimmed during fabrication, the numerical tools were used to design a method for adjusting position of GMR resonances at the time of fabrication.
Tal, Amir; Chen, Yun-Sheng; Williams, Henry E; Rumpf, Raymond C; Kuebler, Stephen M
Fabrication and characterization of three-dimensional copper metallodielectric photonic crystals Journal Article
In: Optics Express, 15 (26), pp. 18283-18293, 2007, ISSN: 1094-4087.
Abstract | Links | BibTeX | Tags: metallodielectric photonic crystal, MPC
@article{RN26,
title = {Fabrication and characterization of three-dimensional copper metallodielectric photonic crystals},
author = {Amir Tal and Yun-Sheng Chen and Henry E Williams and Raymond C Rumpf and Stephen M Kuebler},
url = {https://www.osapublishing.org/oe/fulltext.cfm?uri=oe-15-26-18283&id=148629},
doi = {https://doi.org/10.1364/OE.15.018283},
issn = {1094-4087},
year = {2007},
date = {2007-04-01},
journal = {Optics Express},
volume = {15},
number = {26},
pages = {18283-18293},
abstract = {Three-dimensional metallodielectric photonic crystals were created by fabricating a micron-scale polymeric template using multi-photon direct laser writing (DLW) in SU-8 and conformally and selectively coating the template with copper (Cu) via nanoparticle-nucleated electroless metallization. This process deposits a uniform metal coating, even deep within a lattice, because it is not directional like sputter-coating or evaporative deposition. Infrared reflectance spectra show that upon metallization the optical behavior transitions fully from a dielectric photonic crystal to that of a metal photonic crystal (MPC). After depositing 50 nm of Cu, the MPCs exhibit a strong plasmonic stop band having reflectance greater than 80% across the measured part of the band and reaching as high as 95% at some wavelengths. Numerical simulations match remarkably well with the experimental data and predict all dominant features observed in the reflectance measurements, showing that the MPCs are structurally well formed. These data show that the Cu-based process can be used to create high performance MPCs and devices that are difficult or impossible to fabricate by other means.},
keywords = {metallodielectric photonic crystal, MPC},
pubstate = {published},
tppubtype = {article}
}
Three-dimensional metallodielectric photonic crystals were created by fabricating a micron-scale polymeric template using multi-photon direct laser writing (DLW) in SU-8 and conformally and selectively coating the template with copper (Cu) via nanoparticle-nucleated electroless metallization. This process deposits a uniform metal coating, even deep within a lattice, because it is not directional like sputter-coating or evaporative deposition. Infrared reflectance spectra show that upon metallization the optical behavior transitions fully from a dielectric photonic crystal to that of a metal photonic crystal (MPC). After depositing 50 nm of Cu, the MPCs exhibit a strong plasmonic stop band having reflectance greater than 80% across the measured part of the band and reaching as high as 95% at some wavelengths. Numerical simulations match remarkably well with the experimental data and predict all dominant features observed in the reflectance measurements, showing that the MPCs are structurally well formed. These data show that the Cu-based process can be used to create high performance MPCs and devices that are difficult or impossible to fabricate by other means.
Mehta, A; Rumpf, Raymond; Roth, Zachary; Johnson, Eric G
Simplified fabrication process of 3D photonic crystal optical transmission filter Inproceedings
In: Micromachining Technology for Micro-Optics and Nano-Optics V and Microfabrication Process Technology XII, pp. 64621D, International Society for Optics and Photonics, 2007.
Abstract | Links | BibTeX | Tags: 3D photonic crystal, dielectric filter, dielectric stack, transmission filter
@inproceedings{RN54,
title = {Simplified fabrication process of 3D photonic crystal optical transmission filter},
author = {A Mehta and Raymond Rumpf and Zachary Roth and Eric G Johnson},
url = {https://www.spiedigitallibrary.org/conference-proceedings-of-spie/6462/1/Simplified-fabrication-process-of-3D-photonic-crystal-optical-transmission-filter/10.1117/12.716335.short},
doi = {https://doi.org/10.1117/12.716335},
year = {2007},
date = {2007-03-07},
urldate = {2007-03-07},
booktitle = {Micromachining Technology for Micro-Optics and Nano-Optics V and Microfabrication Process Technology XII},
volume = {6462},
pages = {64621D},
publisher = {International Society for Optics and Photonics},
abstract = {Using a simplified fabrication process, we present the experimental verification of the performance of a 3-D photonic crystal optical transmission filter. Inherent to this unique fabrication approach to the realization of narrow line width, highly efficient optical transmission filters, is the ability to spatially vary the transmission characteristics across the filter aperture. This differentiates this type of filter from conventional dielectric based space variant optical transmission filters which require additional processing at intermediate steps within the dielectric film deposition process. The multilayer stack consists of alternating high and low refractive index dielectric material grown on either side of a high index dielectric spacer layer, which produces a narrow transmission notch in the center of a large stop band. The nano-structuring of a square lattice array of holes and subsequent etching of the pattern through a dielectric stack provides the ability to spatially vary the location of the narrow transmission peak within the wide stop band based off of variation of the hole diameter or lattice constant of the array.},
keywords = {3D photonic crystal, dielectric filter, dielectric stack, transmission filter},
pubstate = {published},
tppubtype = {inproceedings}
}
Using a simplified fabrication process, we present the experimental verification of the performance of a 3-D photonic crystal optical transmission filter. Inherent to this unique fabrication approach to the realization of narrow line width, highly efficient optical transmission filters, is the ability to spatially vary the transmission characteristics across the filter aperture. This differentiates this type of filter from conventional dielectric based space variant optical transmission filters which require additional processing at intermediate steps within the dielectric film deposition process. The multilayer stack consists of alternating high and low refractive index dielectric material grown on either side of a high index dielectric spacer layer, which produces a narrow transmission notch in the center of a large stop band. The nano-structuring of a square lattice array of holes and subsequent etching of the pattern through a dielectric stack provides the ability to spatially vary the location of the narrow transmission peak within the wide stop band based off of variation of the hole diameter or lattice constant of the array.
Mehta, A; Rumpf, R; Johnson, EG
Nano-Fabrication of Space varying spectral filters based on lattice constant variations Presentation
01.03.2007.
BibTeX | Tags:
@misc{RN62,
title = {Nano-Fabrication of Space varying spectral filters based on lattice constant variations},
author = {A Mehta and R Rumpf and EG Johnson},
year = {2007},
date = {2007-03-01},
booktitle = {Computational Optical Sensing and Imaging},
pages = {CMD7},
publisher = {Optical Society of America},
keywords = {},
pubstate = {published},
tppubtype = {presentation}
}
Rumpf, Raymond C; Fiddy, Michael A; Testorf, Markus E
Design of generalized invisible scatterers Journal Article
In: Optics express, 15 (8), pp. 4735-4744, 2007, ISSN: 1094-4087.
Abstract | Links | BibTeX | Tags: cepstral filtering, diffractive optics, electromagnetic cloaking, forward scattering, k-space design, nonlinear optical signal
@article{RN38,
title = {Design of generalized invisible scatterers},
author = {Raymond C Rumpf and Michael A Fiddy and Markus E Testorf},
url = {https://www.osapublishing.org/oe/fulltext.cfm?uri=oe-15-8-4735&id=131871},
doi = {https://doi.org/10.1364/OE.15.004735},
issn = {1094-4087},
year = {2007},
date = {2007-01-01},
journal = {Optics express},
volume = {15},
number = {8},
pages = {4735-4744},
abstract = {A nonlinear signal processing method is applied to the design of strongly scattering objects to realize a defined angular response. Investigated as the complement of inverse scattering problems, k -space design methods are combined with cepstral filtering to obtain a permittivity distribution that scatters with the desired response. Starting with the rigorously computed angular spectrum of the scattering amplitude of an object of simple geometric shape, the corresponding k -space is modified to provide the desired scattering behavior. In order to account for strong scattering, cepstral filtering is applied to map the associated distribution of secondary sources to a unique permittivity distribution. The inversion process results in a structure that exhibits the desired properties and which can be interpreted as a perturbation of the initial structure. Simulation results are presented which illustrate the usefulness of this method. In particular, objects are modified to enhance forward scattering and suppress scattering in all other direction. Results are verified using a rigorous finite-difference frequency-domain scheme to simulate scattering. The method is demonstrated as a novel means for designing invisible objects that act as electromagnetic cloaks.},
keywords = {cepstral filtering, diffractive optics, electromagnetic cloaking, forward scattering, k-space design, nonlinear optical signal},
pubstate = {published},
tppubtype = {article}
}
A nonlinear signal processing method is applied to the design of strongly scattering objects to realize a defined angular response. Investigated as the complement of inverse scattering problems, k -space design methods are combined with cepstral filtering to obtain a permittivity distribution that scatters with the desired response. Starting with the rigorously computed angular spectrum of the scattering amplitude of an object of simple geometric shape, the corresponding k -space is modified to provide the desired scattering behavior. In order to account for strong scattering, cepstral filtering is applied to map the associated distribution of secondary sources to a unique permittivity distribution. The inversion process results in a structure that exhibits the desired properties and which can be interpreted as a perturbation of the initial structure. Simulation results are presented which illustrate the usefulness of this method. In particular, objects are modified to enhance forward scattering and suppress scattering in all other direction. Results are verified using a rigorous finite-difference frequency-domain scheme to simulate scattering. The method is demonstrated as a novel means for designing invisible objects that act as electromagnetic cloaks.
Rumpf, Raymond C; Tal, Amir; Kuebler, Stephen M
Rigorous electromagnetic analysis of volumetrically complex media using the slice absorption method Journal Article
In: JOSA A, 24 (10), pp. 3123-3134, 2007, ISSN: 1520-8532.
Abstract | Links | BibTeX | Tags: electromagnetic analysis, Slice Absorption Method (SAM), Slice Absorption Method (SAM)
@article{RN39,
title = {Rigorous electromagnetic analysis of volumetrically complex media using the slice absorption method},
author = {Raymond C Rumpf and Amir Tal and Stephen M Kuebler},
url = {https://www.osapublishing.org/josaa/abstract.cfm?uri=josaa-24-10-3123},
doi = {https://doi.org/10.1364/JOSAA.24.003123},
issn = {1520-8532},
year = {2007},
date = {2007-01-01},
urldate = {2007-01-01},
journal = {JOSA A},
volume = {24},
number = {10},
pages = {3123-3134},
abstract = {There is tremendous demand for numerical methods to perform rigorous analysis of devices that are both large scale and complex throughout their volume. This can arise when devices must be considered with realistic geometry or when they contain artificial materials such as photonic crystals, left-handed materials, nanoparticles, or other metamaterials. The slice absorption method (SAM) was developed to address this need. The method is fully numerical and able to break large problems down into small pieces, or slices, using matrix division or Gaussian elimination instead of eigensystem computations and scattering matrix manipulations. In these regards, the SAM is an attractive alternative to popular techniques like the finite-difference time domain method, rigorous coupled-wave analysis, and the transfer matrix method. To demonstrate the utility of the SAM and benchmark its accuracy, reflection was simulated for a photonic crystal fabricated in SU-8 by multiphoton direct laser writing. Realistic geometry was incorporated into the model by simulating the microfabrication process, which yielded simulation results that matched experimental measurements remarkably well.},
keywords = {electromagnetic analysis, Slice Absorption Method (SAM), Slice Absorption Method (SAM)},
pubstate = {published},
tppubtype = {article}
}
There is tremendous demand for numerical methods to perform rigorous analysis of devices that are both large scale and complex throughout their volume. This can arise when devices must be considered with realistic geometry or when they contain artificial materials such as photonic crystals, left-handed materials, nanoparticles, or other metamaterials. The slice absorption method (SAM) was developed to address this need. The method is fully numerical and able to break large problems down into small pieces, or slices, using matrix division or Gaussian elimination instead of eigensystem computations and scattering matrix manipulations. In these regards, the SAM is an attractive alternative to popular techniques like the finite-difference time domain method, rigorous coupled-wave analysis, and the transfer matrix method. To demonstrate the utility of the SAM and benchmark its accuracy, reflection was simulated for a photonic crystal fabricated in SU-8 by multiphoton direct laser writing. Realistic geometry was incorporated into the model by simulating the microfabrication process, which yielded simulation results that matched experimental measurements remarkably well.
2006
Rumpf, R. C.; E.G., Johnson
Numerical Modeling of 3D Nanofabrication Presentation
07.06.2006.
@misc{RN163,
title = {Numerical Modeling of 3D Nanofabrication},
author = {R. C. Rumpf and Johnson E.G.},
year = {2006},
date = {2006-06-07},
abstract = {Presented at Micro and Nano-Optics, Optics in the Southeast, June 2006 (Invited Paper)},
keywords = {},
pubstate = {published},
tppubtype = {presentation}
}
Presented at Micro and Nano-Optics, Optics in the Southeast, June 2006 (Invited Paper)
Johnson, EG; Mehta, A; Rumpf, R; Roth, Z; Buhl, K
Diffractive and Micro-Optics for Spatial, Spectral, and Polarization Modification Proceeding
Optical Society of America, 2006.
BibTeX | Tags:
@proceedings{RN63,
title = {Diffractive and Micro-Optics for Spatial, Spectral, and Polarization Modification},
author = {EG Johnson and A Mehta and R Rumpf and Z Roth and K Buhl},
year = {2006},
date = {2006-06-01},
booktitle = {Frontiers in Optics},
pages = {FTuN3},
publisher = {Optical Society of America},
keywords = {},
pubstate = {published},
tppubtype = {proceedings}
}
Newton, Charles M; Rumpf, Raymond C; Gamlen, Carol
Ceramic microelectromechanical structure Miscellaneous
2006.
Abstract | Links | BibTeX | Tags:
@misc{RN59,
title = {Ceramic microelectromechanical structure},
author = {Charles M Newton and Raymond C Rumpf and Carol Gamlen},
url = {https://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO1&Sect2=HITOFF&d=PALL&p=1&u=%2Fnetahtml%2FPTO%2Fsrchnum.htm&r=1&f=G&l=50&s1=7035591.PN.&OS=PN/7035591&RS=PN/7035591},
year = {2006},
date = {2006-04-25},
publisher = {US Patent 7,035,591},
abstract = {A microelectromechanical structure and method is disclosed. A ceramic substrate preferably is formed from low temperature co-fired ceramic sheets. A low loss photodefinable dielectric planarizing layer is formed over one surface of the ceramic substrate. This layer can e a sacrificial layer or a subsequent sacrificial layer added. A photodefined conductor is printed over the low loss dielectric planarizing layer and formed with the sacrificial layer into a structural circuit component. In one aspect of the invention, a switch is formed with a biasing actuator and deflectable member formed over the biasing actuator and moveable into open and closed circuit positions. US Patent 7035591},
keywords = {},
pubstate = {published},
tppubtype = {misc}
}
A microelectromechanical structure and method is disclosed. A ceramic substrate preferably is formed from low temperature co-fired ceramic sheets. A low loss photodefinable dielectric planarizing layer is formed over one surface of the ceramic substrate. This layer can e a sacrificial layer or a subsequent sacrificial layer added. A photodefined conductor is printed over the low loss dielectric planarizing layer and formed with the sacrificial layer into a structural circuit component. In one aspect of the invention, a switch is formed with a biasing actuator and deflectable member formed over the biasing actuator and moveable into open and closed circuit positions. US Patent 7035591
Rumpf, Raymond C
Design and optimization of nano-optical elements by coupling fabrication to optical behavior PhD Thesis
2006.
Abstract | Links | BibTeX | Tags: guided mode resonance (GMR), nanophotonics, photonic crystals
@phdthesis{RN25,
title = {Design and optimization of nano-optical elements by coupling fabrication to optical behavior},
author = {Raymond C Rumpf},
url = {https://stars.library.ucf.edu/cgi/viewcontent.cgi?article=2080&context=etd},
year = {2006},
date = {2006-04-13},
abstract = {Photonic crystals and nanophotonics have received a great deal of attention over the last decade, largely due to improved numerical modeling and advances in fabrication technologies.
To this day, fabrication and optical behavior remain decoupled during the design phase and numerous assumptions are made about "perfect" geometry. As research moves from theory to real devices, predicting device behavior based on realistic geometry becomes critical. In this dissertation, a set of numerical tools was developed to model micro and nano fabrication processes. They were combined with equally capable tools to model optical performance of the simulated structures. Using these tools, it was predicted and demonstrated that 3D nanostructures may be formed on a standard mask aligner. A space-variant photonic crystal filter was designed and optimized based on a simple fabrication method of etching holes through hetero-structured substrates. It was found that hole taper limited their optical performance and a method was developed to compensate. A method was developed to tune the spectral response of guided-mode resonance filters at the time of fabrication using models of etching and deposition.
Autocloning was modeled and shown that it could be used to form extremely high aspect ratio
structures to improve performance of form-birefringent devices. Finally, the numerical tools
were applied to metallic photonic crystal devices.},
keywords = {guided mode resonance (GMR), nanophotonics, photonic crystals},
pubstate = {published},
tppubtype = {phdthesis}
}
Photonic crystals and nanophotonics have received a great deal of attention over the last decade, largely due to improved numerical modeling and advances in fabrication technologies.
To this day, fabrication and optical behavior remain decoupled during the design phase and numerous assumptions are made about "perfect" geometry. As research moves from theory to real devices, predicting device behavior based on realistic geometry becomes critical. In this dissertation, a set of numerical tools was developed to model micro and nano fabrication processes. They were combined with equally capable tools to model optical performance of the simulated structures. Using these tools, it was predicted and demonstrated that 3D nanostructures may be formed on a standard mask aligner. A space-variant photonic crystal filter was designed and optimized based on a simple fabrication method of etching holes through hetero-structured substrates. It was found that hole taper limited their optical performance and a method was developed to compensate. A method was developed to tune the spectral response of guided-mode resonance filters at the time of fabrication using models of etching and deposition.
Autocloning was modeled and shown that it could be used to form extremely high aspect ratio
structures to improve performance of form-birefringent devices. Finally, the numerical tools
were applied to metallic photonic crystal devices.
To this day, fabrication and optical behavior remain decoupled during the design phase and numerous assumptions are made about "perfect" geometry. As research moves from theory to real devices, predicting device behavior based on realistic geometry becomes critical. In this dissertation, a set of numerical tools was developed to model micro and nano fabrication processes. They were combined with equally capable tools to model optical performance of the simulated structures. Using these tools, it was predicted and demonstrated that 3D nanostructures may be formed on a standard mask aligner. A space-variant photonic crystal filter was designed and optimized based on a simple fabrication method of etching holes through hetero-structured substrates. It was found that hole taper limited their optical performance and a method was developed to compensate. A method was developed to tune the spectral response of guided-mode resonance filters at the time of fabrication using models of etching and deposition.
Autocloning was modeled and shown that it could be used to form extremely high aspect ratio
structures to improve performance of form-birefringent devices. Finally, the numerical tools
were applied to metallic photonic crystal devices.
Fiddy, M. A.; Testorf, M. E.; Rumpf, R. C
Imaging and Design Based on Nonlinear Filtering of k-Space Presentation
01.04.2006.
BibTeX | Tags:
@misc{RN158,
title = {Imaging and Design Based on Nonlinear Filtering of k-Space},
author = {M. A. Fiddy and M. E. Testorf and R. C Rumpf},
year = {2006},
date = {2006-04-01},
booktitle = {OSA Annual Meeting},
keywords = {},
pubstate = {published},
tppubtype = {presentation}
}
Rumpf, Raymond C; Srinivasan, Pradeep; Johnson, Eric G
Modeling the fabrication of nano-optical structures Proceeding
International Society for Optics and Photonics, 6110 , 2006.
Abstract | Links | BibTeX | Tags: nano-optical structures, numerical methods, numerical methods
@proceedings{RN42,
title = {Modeling the fabrication of nano-optical structures},
author = {Raymond C Rumpf and Pradeep Srinivasan and Eric G Johnson},
url = {https://www.spiedigitallibrary.org/conference-proceedings-of-spie/6110/1/Modeling-the-fabrication-of-nano-optical-structures/10.1117/12.652604.short},
doi = {https://doi.org/10.1117/12.652604},
year = {2006},
date = {2006-01-23},
booktitle = {Micromachining Technology for Micro-Optics and Nano-Optics IV},
volume = {6110},
pages = {611004},
publisher = {International Society for Optics and Photonics},
abstract = {Over the last two decades, considerable research has been devoted to micro-optic and now nano-optical structures. Fabrication methods have become sufficiently mature to realize most concepts, but due to physics inherent in the process, geometry is distorted. Edges are rounded, sidewalls are sloped, surfaces are rough, and etching or deposition not uniform. Deviations from "perfect" geometry can dramatically affect optical behavior. In order to address the impact of the "non-perfect" nature of fabrication, numerical methods for modeling fabrication is discussed and quantified for various examples. As an example, comprehensive modeling of near-field nano-patterning is described. Numerical and experimental results are presented of three-dimensional photonic crystals fabricated in a contact mask aligner using a standard UV lamp as the source.},
keywords = {nano-optical structures, numerical methods, numerical methods},
pubstate = {published},
tppubtype = {proceedings}
}
Over the last two decades, considerable research has been devoted to micro-optic and now nano-optical structures. Fabrication methods have become sufficiently mature to realize most concepts, but due to physics inherent in the process, geometry is distorted. Edges are rounded, sidewalls are sloped, surfaces are rough, and etching or deposition not uniform. Deviations from "perfect" geometry can dramatically affect optical behavior. In order to address the impact of the "non-perfect" nature of fabrication, numerical methods for modeling fabrication is discussed and quantified for various examples. As an example, comprehensive modeling of near-field nano-patterning is described. Numerical and experimental results are presented of three-dimensional photonic crystals fabricated in a contact mask aligner using a standard UV lamp as the source.
Srinivasan, Pradeep; Rumpf, Raymond C; Johnson, Eric G
Fabrication of 3D photonic crystals by two-step dry etching of layered media Proceeding
International Society for Optics and Photonics, 6110 , 2006.
Abstract | Links | BibTeX | Tags: etching, photonic crystals
@proceedings{RN49,
title = {Fabrication of 3D photonic crystals by two-step dry etching of layered media},
author = {Pradeep Srinivasan and Raymond C Rumpf and Eric G Johnson},
url = {https://www.spiedigitallibrary.org/conference-proceedings-of-spie/6110/1/Fabrication-of-3D-photonic-crystals-by-two-step-dry-etching/10.1117/12.646461.short?SSO=1},
doi = {https://doi.org/10.1117/12.646461},
year = {2006},
date = {2006-01-23},
booktitle = {Micromachining Technology for Micro-Optics and Nano-Optics IV},
volume = {6110},
pages = {611006},
publisher = {International Society for Optics and Photonics},
abstract = {Photonic crystals have received growing interest over the past decade on account of their excellent functionality to guiding and manipulating electromagnetic radiation and their diverse applications. Our approach to fabricate crystals is by a two step etching process in a semiconductor hetero-structure of gallium arsenide (GaAs) and aluminum gallium arsenide (AlGaAs) grown using molecular beam epitaxy (MBE). An array of holes was dry etched in Cl 2 /Ar inductively coupled plasma. Etching selectivity between the mask and the substrate was 10:1.2 By using SF 6 Â in addition to the boron-tri-chloride (BCl 3 ) chemistry, the GaAs is etched selectively over the AlGaAs with selectivities over 5:1. Thus a robust two-step etching process has been developed based entirely on dry etching},
keywords = {etching, photonic crystals},
pubstate = {published},
tppubtype = {proceedings}
}
Photonic crystals have received growing interest over the past decade on account of their excellent functionality to guiding and manipulating electromagnetic radiation and their diverse applications. Our approach to fabricate crystals is by a two step etching process in a semiconductor hetero-structure of gallium arsenide (GaAs) and aluminum gallium arsenide (AlGaAs) grown using molecular beam epitaxy (MBE). An array of holes was dry etched in Cl 2 /Ar inductively coupled plasma. Etching selectivity between the mask and the substrate was 10:1.2 By using SF 6 Â in addition to the boron-tri-chloride (BCl 3 ) chemistry, the GaAs is etched selectively over the AlGaAs with selectivities over 5:1. Thus a robust two-step etching process has been developed based entirely on dry etching
Pike, Randy T; Newton, Charles M; Gamlen, Carol; Rumpf, Raymond C; O'dowd, Betty
Method for making electronic devices including silicon and LTCC and devices produced thereby Patent
2006.
Abstract | Links | BibTeX | Tags:
@patent{RN56,
title = {Method for making electronic devices including silicon and LTCC and devices produced thereby},
author = {Randy T Pike and Charles M Newton and Carol Gamlen and Raymond C Rumpf and Betty O'dowd},
url = {https://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO1&Sect2=HITOFF&d=PALL&p=1&u=%2Fnetahtml%2FPTO%2Fsrchnum.htm&r=1&f=G&l=50&s1=6987033.PN.&OS=PN/6987033&RS=PN/6987033},
year = {2006},
date = {2006-01-17},
publisher = {US Patent 6,987,033},
abstract = {A method for making an electronic device includes positioning first and second members so that opposing surfaces thereof are in contact with one another, the first member comprising silicon and the second member comprising a low temperature co-fired ceramic (LTCC) material. The method further includes anodically bonding together the opposing surfaces of the first and second members to form a hermetic seal therebetween. The anodic bonding provides a secure and strong bond between the members without using adhesive. The method may further include forming at least one cooling structure in at least one of the first and second members. The least one cooling structure may comprise at least one first micro-fluidic cooling structure in the first member, and at least one second micro-fluidic cooling structure in the second member aligned with the at least one first micro-fluidic cooling structure. US Patent 6987033},
keywords = {},
pubstate = {published},
tppubtype = {patent}
}
A method for making an electronic device includes positioning first and second members so that opposing surfaces thereof are in contact with one another, the first member comprising silicon and the second member comprising a low temperature co-fired ceramic (LTCC) material. The method further includes anodically bonding together the opposing surfaces of the first and second members to form a hermetic seal therebetween. The anodic bonding provides a secure and strong bond between the members without using adhesive. The method may further include forming at least one cooling structure in at least one of the first and second members. The least one cooling structure may comprise at least one first micro-fluidic cooling structure in the first member, and at least one second micro-fluidic cooling structure in the second member aligned with the at least one first micro-fluidic cooling structure. US Patent 6987033
Mehta, Alok; Rumpf, RC; Roth, Z; Johnson, EG
Nanofabrication of a space-variant optical transmission filter Journal Article
In: Optics letters, 31 (19), pp. 2903-2905, 2006, ISSN: 1539-4794.
Abstract | Links | BibTeX | Tags: spatial filters, spatially-variant optical transmission filter
@article{RN30,
title = {Nanofabrication of a space-variant optical transmission filter},
author = {Alok Mehta and RC Rumpf and Z Roth and EG Johnson},
url = {https://www.osapublishing.org/ol/abstract.cfm?uri=ol-31-19-2903},
doi = {https://doi.org/10.1364/OL.31.002903},
issn = {1539-4794},
year = {2006},
date = {2006-01-01},
journal = {Optics letters},
volume = {31},
number = {19},
pages = {2903-2905},
abstract = {A space-variant optical transmission filter is demonstrated for which a simplified process is used to tailor the spatial response of the filter across the surface of a single wafer. A multilayer stack, of alternating high or low refractive index dielectric materials, was used to produce a narrow transmission notch in the center of a wide stop band. Subsequent patterning and etching of arrays of holes through the volume of the dielectric stack was performed to control the fill factor of the dielectric in the layers. The position of the transmission notch within the reflection spectrum was varied across the device surface by adjusting the hole diameter of the hole arrays. Experimental and numerical simulation were used to confirm the space-variant transmission characteristics of a single-wafer sample with two zones of different hole diameter arrays in the 1550 nm 1550nm  wavelength regime.},
keywords = {spatial filters, spatially-variant optical transmission filter},
pubstate = {published},
tppubtype = {article}
}
A space-variant optical transmission filter is demonstrated for which a simplified process is used to tailor the spatial response of the filter across the surface of a single wafer. A multilayer stack, of alternating high or low refractive index dielectric materials, was used to produce a narrow transmission notch in the center of a wide stop band. Subsequent patterning and etching of arrays of holes through the volume of the dielectric stack was performed to control the fill factor of the dielectric in the layers. The position of the transmission notch within the reflection spectrum was varied across the device surface by adjusting the hole diameter of the hole arrays. Experimental and numerical simulation were used to confirm the space-variant transmission characteristics of a single-wafer sample with two zones of different hole diameter arrays in the <nobr aria-hidden="true" style="box-sizing: border-box; transition: none 0s ease 0s; border: 0px; padding: 0px; margin: 0px; max-width: none; max-height: none; min-width: 0px; min-height: 0px; vertical-align: 0px; line-height: normal;"> 1550 nm 1550nm  wavelength regime.
2005
Rumpf, Raymond C; Srinivasan, Pradeep; Johnson, Eric G
Near-Field Nano-Patterning of 3D Structures Presentation
15.10.2005.
BibTeX | Tags:
@misc{RN69,
title = {Near-Field Nano-Patterning of 3D Structures},
author = {Raymond C Rumpf and Pradeep Srinivasan and Eric G Johnson},
year = {2005},
date = {2005-10-15},
booktitle = {Frontiers in Optics},
pages = {FWS2},
publisher = {Optical Society of America},
keywords = {},
pubstate = {published},
tppubtype = {presentation}
}
Snyder, Steven Robert; Brown, Stephen B; Rumpf, Raymond C; Pigon, Brett; Rawnick, James J
RF delay lines with variable composition fluidic dielectric Patent
2005.
Abstract | Links | BibTeX | Tags:
@patent{RN52,
title = {RF delay lines with variable composition fluidic dielectric},
author = {Steven Robert Snyder and Stephen B Brown and Raymond C Rumpf and Brett Pigon and James J Rawnick},
url = {https://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO1&Sect2=HITOFF&d=PALL&p=1&u=%2Fnetahtml%2FPTO%2Fsrchnum.htm&r=1&f=G&l=50&s1=6930568.PN.&OS=PN/6930568&RS=PN/6930568},
year = {2005},
date = {2005-08-16},
publisher = {US Patent 6,930,568},
abstract = {Method and apparatus for producing a variable delay for an RF signal. The method can include the step of propagating the RF signal along an RF transmission line, coupling a fluidic dielectric to the RF transmission line, and dynamically changing a composition of the fluidic dielectric to selectively vary its permittivity in response to a time delay control signal. The method can also include the step of dynamically changing a composition of the fluidic dielectric to vary its permeability. The permittivity and the permeability can be varied concurrently in response to the time delay control signal. In a preferred embodiment the method can include selectively varying the permeability concurrently with the permittivity to maintain a characteristic impedance of the transmission line approximately constant. US Patent 6930568},
keywords = {},
pubstate = {published},
tppubtype = {patent}
}
Method and apparatus for producing a variable delay for an RF signal. The method can include the step of propagating the RF signal along an RF transmission line, coupling a fluidic dielectric to the RF transmission line, and dynamically changing a composition of the fluidic dielectric to selectively vary its permittivity in response to a time delay control signal. The method can also include the step of dynamically changing a composition of the fluidic dielectric to vary its permeability. The permittivity and the permeability can be varied concurrently in response to the time delay control signal. In a preferred embodiment the method can include selectively varying the permeability concurrently with the permittivity to maintain a characteristic impedance of the transmission line approximately constant. US Patent 6930568
Rumpf, Raymond C; Johnson, Eric G
Comprehensive modeling of near-field nano-patterning Journal Article
In: Optics express, 13 (18), pp. 7198-7208, 2005, ISSN: 1094-4087.
Abstract | Links | BibTeX | Tags:
@article{RN28,
title = {Comprehensive modeling of near-field nano-patterning},
author = {Raymond C Rumpf and Eric G Johnson},
url = {https://www.osapublishing.org/oe/fulltext.cfm?uri=oe-13-18-7198&id=85394},
doi = {https://doi.org/10.1364/OPEX.13.007198},
issn = {1094-4087},
year = {2005},
date = {2005-08-01},
journal = {Optics express},
volume = {13},
number = {18},
pages = {7198-7208},
abstract = {Near-field nano-patterning greatly simplifies holographic lithography, but deformations in formed structures are potentially severe. A fast and efficient comprehensive model was developed to predict geometry more rigorously. Numerical results show simple intensity-threshold methods do not accurately predict shape or optical behavior. By modeling sources with partial coherence, unpolarized light, and an angular spectrum, it is shown that standard UV lamps can be used to form 3D structures.},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
Near-field nano-patterning greatly simplifies holographic lithography, but deformations in formed structures are potentially severe. A fast and efficient comprehensive model was developed to predict geometry more rigorously. Numerical results show simple intensity-threshold methods do not accurately predict shape or optical behavior. By modeling sources with partial coherence, unpolarized light, and an angular spectrum, it is shown that standard UV lamps can be used to form 3D structures.
Rumpf, Raymond C; Murshid, Syed H
Fiber optic Fabry-Perot interferometer and associated methods Patent
2005.
Abstract | Links | BibTeX | Tags:
@patent{RN31,
title = {Fiber optic Fabry-Perot interferometer and associated methods},
author = {Raymond C Rumpf and Syed H Murshid},
url = {https://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO1&Sect2=HITOFF&d=PALL&p=1&u=%2Fnetahtml%2FPTO%2Fsrchnum.htm&r=1&f=G&l=50&s1=6886365.PN.&OS=PN/6886365&RS=PN/6886365},
year = {2005},
date = {2005-05-03},
publisher = {US Patent 6,886,365},
abstract = {The method for making the fiber optic Fabry-Perot sensor includes securing an optical fiber to a substrate, and forming at least one gap in the optical fiber after the optical fiber is secured to the substrate to define at least one pair of self-aligned opposing spaced apart optical fiber end faces for the Fabry-Perot sensor. Preferably, an adhesive directly secures the at least one pair of optical fiber portions to the substrate. The opposing spaced apart optical fiber end faces are self-aligned because the pair of optical fiber end portions are formed from a single fiber which has been directly secured to the substrate. Also, each of the self-aligned spaced apart optical fiber end faces may be substantially rounded due to an electrical discharge used to form the gap. This results in integral lenses being formed as the end faces of the fiber portions. US Patent 6886365},
keywords = {},
pubstate = {published},
tppubtype = {patent}
}
The method for making the fiber optic Fabry-Perot sensor includes securing an optical fiber to a substrate, and forming at least one gap in the optical fiber after the optical fiber is secured to the substrate to define at least one pair of self-aligned opposing spaced apart optical fiber end faces for the Fabry-Perot sensor. Preferably, an adhesive directly secures the at least one pair of optical fiber portions to the substrate. The opposing spaced apart optical fiber end faces are self-aligned because the pair of optical fiber end portions are formed from a single fiber which has been directly secured to the substrate. Also, each of the self-aligned spaced apart optical fiber end faces may be substantially rounded due to an electrical discharge used to form the gap. This results in integral lenses being formed as the end faces of the fiber portions. US Patent 6886365
Rumpf, Raymond C; Johnson, Eric G
Modeling the formation of photonic crystals by holographic lithography Proceeding
International Society for Optics and Photonics, 5720 , 2005.
Abstract | Links | BibTeX | Tags: holographic lithography, photolithography, photonic crystals
@proceedings{RN43,
title = {Modeling the formation of photonic crystals by holographic lithography},
author = {Raymond C Rumpf and Eric G Johnson},
url = {https://www.spiedigitallibrary.org/conference-proceedings-of-spie/5720/1/Modeling-the-formation-of-photonic-crystals-by-holographic-lithography/10.1117/12.601186.short},
doi = {https://doi.org/10.1117/12.601186},
year = {2005},
date = {2005-01-22},
booktitle = {Micromachining Technology for Micro-Optics and Nano-Optics III},
volume = {5720},
pages = {18-26},
publisher = {International Society for Optics and Photonics},
abstract = {An approach is introduced to accurately explore methods of fabricating photonic crystals formed by holographic lithography. Analytical background is given for synthesizing the exposure beam configuration to form the desired lattice. This is combined with a comprehensive model that can predict lattice distortions due to physics of the photolithography process. Simulations are compared to experimental results and to results obtained by conventional intensity threshold methods.},
keywords = {holographic lithography, photolithography, photonic crystals},
pubstate = {published},
tppubtype = {proceedings}
}
An approach is introduced to accurately explore methods of fabricating photonic crystals formed by holographic lithography. Analytical background is given for synthesizing the exposure beam configuration to form the desired lattice. This is combined with a comprehensive model that can predict lattice distortions due to physics of the photolithography process. Simulations are compared to experimental results and to results obtained by conventional intensity threshold methods.
2004
Jr, Raymond Charles Rumpf; Killen, William D; Pike, Randy T
Substrate enhancement for improved signal characteristics on a discontinuous transmission line Patent
2004.
Abstract | Links | BibTeX | Tags:
@patent{RN22,
title = {Substrate enhancement for improved signal characteristics on a discontinuous transmission line},
author = {Raymond Charles Rumpf Jr and William D Killen and Randy T Pike},
url = {https://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO1&Sect2=HITOFF&d=PALL&p=1&u=%2Fnetahtml%2FPTO%2Fsrchnum.htm&r=1&f=G&l=50&s1=6825743.PN.&OS=PN/6825743&RS=PN/6825743},
year = {2004},
date = {2004-11-30},
publisher = {US Patent 6,825,743},
abstract = {A circuit for processing radio frequency signals. The circuit can include a substrate board that has at least one dielectric layer (100) having a first set of substrate properties over a first region (102). The first set of substrate properties can include a first permittivity and a first permeability. A second region (140) can be provided with a set of second substrate properties. The second region can have a second set of substrate properties including a second permittivity and a second permeability. The second permittivity can be different than the first permittivity and/or the second permeability can be different than the first permeability. A first transmission line (102) having at least one discontinuity can be coupled to the second region (108). The discontinuity can include a bend, corner, non-uniformity, break in the transmission line, or a junction between the first transmission line and a second transmission line. US Patent 6825743},
keywords = {},
pubstate = {published},
tppubtype = {patent}
}
A circuit for processing radio frequency signals. The circuit can include a substrate board that has at least one dielectric layer (100) having a first set of substrate properties over a first region (102). The first set of substrate properties can include a first permittivity and a first permeability. A second region (140) can be provided with a set of second substrate properties. The second region can have a second set of substrate properties including a second permittivity and a second permeability. The second permittivity can be different than the first permittivity and/or the second permeability can be different than the first permeability. A first transmission line (102) having at least one discontinuity can be coupled to the second region (108). The discontinuity can include a bend, corner, non-uniformity, break in the transmission line, or a junction between the first transmission line and a second transmission line. US Patent 6825743
Pike, Randy T; Newton, Charles M; Gamlen, Carol; Rumpf, Raymond C; O'dowd, Betty
Method for making electronic devices including silicon and LTCC and devices produced thereby Patent
2004.
Abstract | Links | BibTeX | Tags:
@patent{RN134,
title = {Method for making electronic devices including silicon and LTCC and devices produced thereby},
author = {Randy T Pike and Charles M Newton and Carol Gamlen and Raymond C Rumpf and Betty O'dowd},
url = {https://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO1&Sect2=HITOFF&d=PALL&p=1&u=%2Fnetahtml%2FPTO%2Fsrchnum.htm&r=1&f=G&l=50&s1=6809424.PN.&OS=PN/6809424&RS=PN/6809424},
year = {2004},
date = {2004-10-26},
urldate = {2004-10-26},
publisher = {US Patent 6,809,424},
abstract = {A method for making an electronic device includes positioning first and second members so that opposing surfaces thereof are in contact with one another, the first member comprising silicon and the second member comprising a low temperature co-fired ceramic (LTCC) material. The method further includes anodically bonding together the opposing surfaces of the first and second members to form a hermetic seal therebetween. The anodic bonding provides a secure and strong bond between the members without using adhesive. The method may further include forming at least one cooling structure in at least one of the first and second members. The least one cooling structure may comprise at least one first micro-fluidic cooling structure in the first member, and at least one second micro-fluidic cooling structure in the second member aligned with the at least one first micro-fluidic cooling structure. US Patent 6809424},
keywords = {},
pubstate = {published},
tppubtype = {patent}
}
A method for making an electronic device includes positioning first and second members so that opposing surfaces thereof are in contact with one another, the first member comprising silicon and the second member comprising a low temperature co-fired ceramic (LTCC) material. The method further includes anodically bonding together the opposing surfaces of the first and second members to form a hermetic seal therebetween. The anodic bonding provides a secure and strong bond between the members without using adhesive. The method may further include forming at least one cooling structure in at least one of the first and second members. The least one cooling structure may comprise at least one first micro-fluidic cooling structure in the first member, and at least one second micro-fluidic cooling structure in the second member aligned with the at least one first micro-fluidic cooling structure. US Patent 6809424
Newton, Charles M; Rumpf, Raymond C; Gamlen, Carol
Ceramic microelectromechanical structure Patent
2004.
Abstract | Links | BibTeX | Tags:
@patent{RN40,
title = {Ceramic microelectromechanical structure},
author = {Charles M Newton and Raymond C Rumpf and Carol Gamlen},
url = {https://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO1&Sect2=HITOFF&d=PALL&p=1&u=%2Fnetahtml%2FPTO%2Fsrchnum.htm&r=1&f=G&l=50&s1=6738600.PN.&OS=PN/6738600&RS=PN/6738600},
year = {2004},
date = {2004-05-18},
urldate = {2006-04-25},
publisher = {US Patent 6,738,600},
abstract = {A microelectromechanical structure and method is disclosed. A ceramic substrate preferably is formed from low temperature co-fired ceramic sheets. A low loss photodefinable dielectric planarizing layer is formed over one surface of the ceramic substrate. This layer can be a sacrificial layer or a subsequent sacrificial layer added. A photodefined conductor is printed over the low loss dielectric planarizing layer and formed with the sacrificial layer into a structural circuit component. In one aspect of the invention, a switch is formed with a biasing actuator and deflectable member formed over the biasing actuator and moveable into open and closed circuit positions. US Patent 6738600},
keywords = {},
pubstate = {published},
tppubtype = {patent}
}
A microelectromechanical structure and method is disclosed. A ceramic substrate preferably is formed from low temperature co-fired ceramic sheets. A low loss photodefinable dielectric planarizing layer is formed over one surface of the ceramic substrate. This layer can be a sacrificial layer or a subsequent sacrificial layer added. A photodefined conductor is printed over the low loss dielectric planarizing layer and formed with the sacrificial layer into a structural circuit component. In one aspect of the invention, a switch is formed with a biasing actuator and deflectable member formed over the biasing actuator and moveable into open and closed circuit positions. US Patent 6738600
Rumpf, Raymond C; Johnson, Eric G
Fully three-dimensional modeling of the fabrication and behavior of photonic crystals formed by holographic lithography Journal Article
In: JOSA A, 21 (9), pp. 1703-1713, 2004, ISSN: 1520-8532.
Abstract | Links | BibTeX | Tags: face-centered-cubic photonic crystal, holographic lithography, optical absorption, photonic crystals
@article{RN23,
title = {Fully three-dimensional modeling of the fabrication and behavior of photonic crystals formed by holographic lithography},
author = {Raymond C Rumpf and Eric G Johnson},
url = {https://www.osapublishing.org/josaa/abstract.cfm?uri=josaa-21-9-1703},
doi = {https://doi.org/10.1364/JOSAA.21.001703},
issn = {1520-8532},
year = {2004},
date = {2004-05-01},
urldate = {2004-05-01},
journal = {JOSA A},
volume = {21},
number = {9},
pages = {1703-1713},
abstract = {A comprehensive and fully three-dimensional model of holographic lithography is used to predict more rigorously the geometry and transmission spectra of photonic crystals formed in Epon ®  SU-8 photoresist. It is the first effort known to the authors to incorporate physics of exposure, postexposure baking, and developing into three-dimensional models of photonic crystals. Optical absorption, reflections, standing waves, refraction, beam coherence, acid diffusion, resist shrinkage, and developing effects combine to distort lattices from their ideal geometry. These are completely neglected by intensity-threshold methods used throughout the literature to predict lattices. Numerical simulations compare remarkably well with experimental results for a face-centered-cube (FCC) photonic crystal. Absorption is shown to produce chirped lattices with broadened bandgaps. Reflections are shown to significantly alter lattice geometry and reduce image contrast. Through simulation, a diamond lattice is formed by multiple exposures, and a hybrid trigonal–FCC lattice is formed that exhibits properties of both component lattices.},
keywords = {face-centered-cubic photonic crystal, holographic lithography, optical absorption, photonic crystals},
pubstate = {published},
tppubtype = {article}
}
A comprehensive and fully three-dimensional model of holographic lithography is used to predict more rigorously the geometry and transmission spectra of photonic crystals formed in Epon ®  SU-8 photoresist. It is the first effort known to the authors to incorporate physics of exposure, postexposure baking, and developing into three-dimensional models of photonic crystals. Optical absorption, reflections, standing waves, refraction, beam coherence, acid diffusion, resist shrinkage, and developing effects combine to distort lattices from their ideal geometry. These are completely neglected by intensity-threshold methods used throughout the literature to predict lattices. Numerical simulations compare remarkably well with experimental results for a face-centered-cube (FCC) photonic crystal. Absorption is shown to produce chirped lattices with broadened bandgaps. Reflections are shown to significantly alter lattice geometry and reduce image contrast. Through simulation, a diamond lattice is formed by multiple exposures, and a hybrid trigonal–FCC lattice is formed that exhibits properties of both component lattices.
Rumpf, Raymond C; Johnson, Eric G
Microphotonic systems utilizing SU-8 Inproceedings
In: MOEMS and Miniaturized Systems IV, pp. 64-72, International Society for Optics and Photonics, 2004.
Abstract | Links | BibTeX | Tags: lithography, photoresist, SU-8
@inproceedings{RN33,
title = {Microphotonic systems utilizing SU-8},
author = {Raymond C Rumpf and Eric G Johnson},
url = {https://www.spiedigitallibrary.org/conference-proceedings-of-spie/5346/1/Microphotonic-systems-utilizing-SU-8/10.1117/12.533352.short},
doi = {https://doi.org/10.1117/12.533352},
year = {2004},
date = {2004-01-24},
booktitle = {MOEMS and Miniaturized Systems IV},
volume = {5346},
pages = {64-72},
publisher = {International Society for Optics and Photonics},
abstract = {SU-8 is a negative-tone photoresist that can serve as a complete optical bench for micro-photonic systems. Functional optical devices and passive alignment structures can all be formed in the same material system with common processing steps. Many interrelated process parameters control the final geometry of structures formed in SU-8, but all can be accurately simulated and predicted by computer modeling. In this work, a comprehensive model of the lithography process was developed and combined with rigorous electromagnetic simulation. It was applied to predict sidewall slope of a tall structures as well as the geometry and transmission spectra of a three-dimensional photonic crystal. The model is seen as an enabling step toward realizing optimized micro-photonic systems in SU-8.},
keywords = {lithography, photoresist, SU-8},
pubstate = {published},
tppubtype = {inproceedings}
}
SU-8 is a negative-tone photoresist that can serve as a complete optical bench for micro-photonic systems. Functional optical devices and passive alignment structures can all be formed in the same material system with common processing steps. Many interrelated process parameters control the final geometry of structures formed in SU-8, but all can be accurately simulated and predicted by computer modeling. In this work, a comprehensive model of the lithography process was developed and combined with rigorous electromagnetic simulation. It was applied to predict sidewall slope of a tall structures as well as the geometry and transmission spectra of a three-dimensional photonic crystal. The model is seen as an enabling step toward realizing optimized micro-photonic systems in SU-8.
2003
Rumpf, Raymond C; Newton, Charles M
MEMS reconfigurable optical grating Patent
2003.
Abstract | Links | BibTeX | Tags:
@patent{RN47,
title = {MEMS reconfigurable optical grating},
author = {Raymond C Rumpf and Charles M Newton},
url = {https://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO1&Sect2=HITOFF&d=PALL&p=1&u=%2Fnetahtml%2FPTO%2Fsrchnum.htm&r=1&f=G&l=50&s1=6628851.PN.&OS=PN/6628851&RS=PN/6628851},
year = {2003},
date = {2003-09-30},
publisher = {US Patent 6,628,851},
abstract = {A tunable grating apparatus includes a plurality of grating structures contained within an optical transmission path. A microelectromechanical (MEMS) actuator is operatively connected to each grating structure for changing the separation between the grating structures and tuning the grating to a desired wavelength selectivity. The grating structures preferably form a Bragg grating. US Patent 6628851},
keywords = {},
pubstate = {published},
tppubtype = {patent}
}
A tunable grating apparatus includes a plurality of grating structures contained within an optical transmission path. A microelectromechanical (MEMS) actuator is operatively connected to each grating structure for changing the separation between the grating structures and tuning the grating to a desired wavelength selectivity. The grating structures preferably form a Bragg grating. US Patent 6628851
Rumpf, Raymond C; Newton, Charles M
Variable sensitivity acoustic transducer Patent
2003.
Abstract | Links | BibTeX | Tags:
@patent{RN50,
title = {Variable sensitivity acoustic transducer},
author = {Raymond C Rumpf and Charles M Newton},
url = {https://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO1&Sect2=HITOFF&d=PALL&p=1&u=%2Fnetahtml%2FPTO%2Fsrchnum.htm&r=1&f=G&l=50&s1=6542244.PN.&OS=PN/6542244&RS=PN/6542244},
year = {2003},
date = {2003-04-01},
urldate = {2003-04-01},
publisher = {US Patent 6,542,244},
abstract = {The gauge length of an acoustic signal detector is dynamically variable by adjusting the location of an induced light reflection interface within a section of optical waveguide to which an acoustic stimulus is coupled. In an interferometer based architecture, a light beam is applied to each of an `acoustic signal detection` optical waveguide and a `reference` optical waveguide. The `acoustic signal detection` waveguide is coupled to an acoustic energy transmission element. The acoustic input modifies the index of refraction of the optical waveguide and modulates the light passing through the waveguide. Since the index of refraction of the optical waveguide section is modified by the acoustic stimulus, the signal beam has a phase delay dependent upon the acoustic signal and the distance between one end of the signal waveguide section and an induced reflection interface. The `reference` optical waveguide section also contains a reflection interface, the induced location of which is ganged with that of the signal optical waveguide section. The `signal` path and `reference` path beams reflected by their reflection interfaces are combined and applied to a photo-detector. The index of refraction of the material of the signal optical waveguide section is modified by the acoustic stimulus is the `signal path`. This `signal` path light beam is combined out of phase with `reference` light beam at the photo-detector. US Patent 6542244},
keywords = {},
pubstate = {published},
tppubtype = {patent}
}
The gauge length of an acoustic signal detector is dynamically variable by adjusting the location of an induced light reflection interface within a section of optical waveguide to which an acoustic stimulus is coupled. In an interferometer based architecture, a light beam is applied to each of an `acoustic signal detection` optical waveguide and a `reference` optical waveguide. The `acoustic signal detection` waveguide is coupled to an acoustic energy transmission element. The acoustic input modifies the index of refraction of the optical waveguide and modulates the light passing through the waveguide. Since the index of refraction of the optical waveguide section is modified by the acoustic stimulus, the signal beam has a phase delay dependent upon the acoustic signal and the distance between one end of the signal waveguide section and an induced reflection interface. The `reference` optical waveguide section also contains a reflection interface, the induced location of which is ganged with that of the signal optical waveguide section. The `signal` path and `reference` path beams reflected by their reflection interfaces are combined and applied to a photo-detector. The index of refraction of the material of the signal optical waveguide section is modified by the acoustic stimulus is the `signal path`. This `signal` path light beam is combined out of phase with `reference` light beam at the photo-detector. US Patent 6542244
2002
Smith, Brian Ronald; Rumpf, Raymond Charles; Newton, Charles Michael
2002.
Abstract | Links | BibTeX | Tags:
@patent{RN41,
title = {Electronic module including a cooling substrate having a fluid cooling circuit therein and related methods},
author = {Brian Ronald Smith and Raymond Charles Rumpf and Charles Michael Newton},
url = {https://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO1&Sect2=HITOFF&d=PALL&p=1&u=%2Fnetahtml%2FPTO%2Fsrchnum.htm&r=1&f=G&l=50&s1=6452798.PN.&OS=PN/6452798&RS=PN/6452798},
year = {2002},
date = {2002-09-17},
publisher = {US Patent 6,452,798},
abstract = {A method for making an electronic module includes forming a cooling substrate having a fluid cooling circuit therein having a vertical passageway. The cooling substrate may be formed by forming a plurality of unsintered ceramic layers having passageways therein. The plurality of unsintered ceramic layers and at least one resistive element may be assembled in stacked relation so that the passageways align to define the fluid cooling circuit and so that the at least one resistive element extends in a cantilever fashion into the vertical passageway. Furthermore, the unsintered ceramic layers and the at least one resistive element may be heated to sinter and to cause the at least one resistive element to soften and deform downwardly adjacent vertical sidewall portions of the vertical passageway. The method may also include mounting at least one electronic device on the cooling substrate in thermal communication with the fluid cooling circuit. US Patent 6452798},
keywords = {},
pubstate = {published},
tppubtype = {patent}
}
A method for making an electronic module includes forming a cooling substrate having a fluid cooling circuit therein having a vertical passageway. The cooling substrate may be formed by forming a plurality of unsintered ceramic layers having passageways therein. The plurality of unsintered ceramic layers and at least one resistive element may be assembled in stacked relation so that the passageways align to define the fluid cooling circuit and so that the at least one resistive element extends in a cantilever fashion into the vertical passageway. Furthermore, the unsintered ceramic layers and the at least one resistive element may be heated to sinter and to cause the at least one resistive element to soften and deform downwardly adjacent vertical sidewall portions of the vertical passageway. The method may also include mounting at least one electronic device on the cooling substrate in thermal communication with the fluid cooling circuit. US Patent 6452798
Newton, Charles M; Gamlen, Carol A; Jr, Raymond C Rumpf
Thermally enhanced microcircuit package and method of forming same Patent
2002.
Abstract | Links | BibTeX | Tags:
@patent{RN21,
title = {Thermally enhanced microcircuit package and method of forming same},
author = {Charles M Newton and Carol A Gamlen and Raymond C Rumpf Jr},
url = {https://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO1&Sect2=HITOFF&d=PALL&p=1&u=%2Fnetahtml%2FPTO%2Fsrchnum.htm&r=1&f=G&l=50&s1=6,437,981.PN.&OS=PN/6,437,981&RS=PN/6,437,981},
year = {2002},
date = {2002-08-20},
publisher = {US Patent 6,437,981},
abstract = {A thermally enhanced microcircuit package includes a microcircuit package having a microcircuit device cavity that receives a microcircuit device. A microelectromechanical (MEMS) cooling module is operatively connected to the microcircuit package and forms a capillary pumped loop cooling circuit having an evaporator, condenser and interconnecting cooling fluid channels for passing vapor and fluid between the evaporator and condenser and evaporating and condensing the cooling fluid. The evaporator is operatively associated with the microcircuit device for cooling the device when in use. US Patent 6,437,981},
keywords = {},
pubstate = {published},
tppubtype = {patent}
}
A thermally enhanced microcircuit package includes a microcircuit package having a microcircuit device cavity that receives a microcircuit device. A microelectromechanical (MEMS) cooling module is operatively connected to the microcircuit package and forms a capillary pumped loop cooling circuit having an evaporator, condenser and interconnecting cooling fluid channels for passing vapor and fluid between the evaporator and condenser and evaporating and condensing the cooling fluid. The evaporator is operatively associated with the microcircuit device for cooling the device when in use. US Patent 6,437,981