2005
Rumpf, Raymond C; Johnson, Eric G
Modeling the formation of photonic crystals by holographic lithography Proceedings
International Society for Optics and Photonics, vol. 5720, 2005.
Abstract | Links | BibTeX | Tags: holographic lithography, photolithography, photonic crystals
@proceedings{RN43,
title = {Modeling the formation of photonic crystals by holographic lithography},
author = {Raymond C Rumpf and Eric G Johnson},
url = {https://www.spiedigitallibrary.org/conference-proceedings-of-spie/5720/1/Modeling-the-formation-of-photonic-crystals-by-holographic-lithography/10.1117/12.601186.short},
doi = {https://doi.org/10.1117/12.601186},
year = {2005},
date = {2005-01-22},
booktitle = {Micromachining Technology for Micro-Optics and Nano-Optics III},
volume = {5720},
pages = {18-26},
publisher = {International Society for Optics and Photonics},
abstract = {An approach is introduced to accurately explore methods of fabricating photonic crystals formed by holographic lithography. Analytical background is given for synthesizing the exposure beam configuration to form the desired lattice. This is combined with a comprehensive model that can predict lattice distortions due to physics of the photolithography process. Simulations are compared to experimental results and to results obtained by conventional intensity threshold methods.},
keywords = {holographic lithography, photolithography, photonic crystals},
pubstate = {published},
tppubtype = {proceedings}
}
An approach is introduced to accurately explore methods of fabricating photonic crystals formed by holographic lithography. Analytical background is given for synthesizing the exposure beam configuration to form the desired lattice. This is combined with a comprehensive model that can predict lattice distortions due to physics of the photolithography process. Simulations are compared to experimental results and to results obtained by conventional intensity threshold methods.
2004
Rumpf, Raymond C; Johnson, Eric G
Fully three-dimensional modeling of the fabrication and behavior of photonic crystals formed by holographic lithography Journal Article
In: JOSA A, vol. 21, no. 9, pp. 1703-1713, 2004, ISSN: 1520-8532.
Abstract | Links | BibTeX | Tags: face-centered-cubic photonic crystal, holographic lithography, optical absorption, photonic crystals
@article{RN23,
title = {Fully three-dimensional modeling of the fabrication and behavior of photonic crystals formed by holographic lithography},
author = {Raymond C Rumpf and Eric G Johnson},
url = {https://www.osapublishing.org/josaa/abstract.cfm?uri=josaa-21-9-1703},
doi = {https://doi.org/10.1364/JOSAA.21.001703},
issn = {1520-8532},
year = {2004},
date = {2004-05-01},
urldate = {2004-05-01},
journal = {JOSA A},
volume = {21},
number = {9},
pages = {1703-1713},
abstract = {A comprehensive and fully three-dimensional model of holographic lithography is used to predict more rigorously the geometry and transmission spectra of photonic crystals formed in Epon ®  SU-8 photoresist. It is the first effort known to the authors to incorporate physics of exposure, postexposure baking, and developing into three-dimensional models of photonic crystals. Optical absorption, reflections, standing waves, refraction, beam coherence, acid diffusion, resist shrinkage, and developing effects combine to distort lattices from their ideal geometry. These are completely neglected by intensity-threshold methods used throughout the literature to predict lattices. Numerical simulations compare remarkably well with experimental results for a face-centered-cube (FCC) photonic crystal. Absorption is shown to produce chirped lattices with broadened bandgaps. Reflections are shown to significantly alter lattice geometry and reduce image contrast. Through simulation, a diamond lattice is formed by multiple exposures, and a hybrid trigonal–FCC lattice is formed that exhibits properties of both component lattices.},
keywords = {face-centered-cubic photonic crystal, holographic lithography, optical absorption, photonic crystals},
pubstate = {published},
tppubtype = {article}
}
A comprehensive and fully three-dimensional model of holographic lithography is used to predict more rigorously the geometry and transmission spectra of photonic crystals formed in Epon ®  SU-8 photoresist. It is the first effort known to the authors to incorporate physics of exposure, postexposure baking, and developing into three-dimensional models of photonic crystals. Optical absorption, reflections, standing waves, refraction, beam coherence, acid diffusion, resist shrinkage, and developing effects combine to distort lattices from their ideal geometry. These are completely neglected by intensity-threshold methods used throughout the literature to predict lattices. Numerical simulations compare remarkably well with experimental results for a face-centered-cube (FCC) photonic crystal. Absorption is shown to produce chirped lattices with broadened bandgaps. Reflections are shown to significantly alter lattice geometry and reduce image contrast. Through simulation, a diamond lattice is formed by multiple exposures, and a hybrid trigonal–FCC lattice is formed that exhibits properties of both component lattices.