2005
Rumpf, Raymond C; Johnson, Eric G
Modeling the formation of photonic crystals by holographic lithography Proceeding
International Society for Optics and Photonics, vol. 5720, 2005.
Abstract | Links | BibTeX | Tags: holographic lithography, photolithography, photonic crystals
@proceedings{RN43,
title = {Modeling the formation of photonic crystals by holographic lithography},
author = {Raymond C Rumpf and Eric G Johnson},
url = {https://www.spiedigitallibrary.org/conference-proceedings-of-spie/5720/1/Modeling-the-formation-of-photonic-crystals-by-holographic-lithography/10.1117/12.601186.short},
doi = {https://doi.org/10.1117/12.601186},
year = {2005},
date = {2005-01-22},
booktitle = {Micromachining Technology for Micro-Optics and Nano-Optics III},
volume = {5720},
pages = {18-26},
publisher = {International Society for Optics and Photonics},
abstract = {An approach is introduced to accurately explore methods of fabricating photonic crystals formed by holographic lithography. Analytical background is given for synthesizing the exposure beam configuration to form the desired lattice. This is combined with a comprehensive model that can predict lattice distortions due to physics of the photolithography process. Simulations are compared to experimental results and to results obtained by conventional intensity threshold methods.},
keywords = {holographic lithography, photolithography, photonic crystals},
pubstate = {published},
tppubtype = {proceedings}
}
An approach is introduced to accurately explore methods of fabricating photonic crystals formed by holographic lithography. Analytical background is given for synthesizing the exposure beam configuration to form the desired lattice. This is combined with a comprehensive model that can predict lattice distortions due to physics of the photolithography process. Simulations are compared to experimental results and to results obtained by conventional intensity threshold methods.