2012
Kuebler, Stephen M; Williams, Henry E; Freppon, Daniel J; Rumpf, Raymond C; Melino, Marco A
Creation of three-dimensional micro-photonic structures on the end-face of optical fibers Journal Article
In: Journal of Laser Micro Nanoengineering, vol. 7, no. 3, pp. 293, 2012.
Abstract | Links | BibTeX | Tags: Applied, laser materials processing, micro-optics, microstructure fabrication, Multidisciplinary Optics Physics, nanophotonics, photonic crystals, SU-8
@article{RN60,
title = {Creation of three-dimensional micro-photonic structures on the end-face of optical fibers},
author = {Stephen M Kuebler and Henry E Williams and Daniel J Freppon and Raymond C Rumpf and Marco A Melino},
url = {https://stars.library.ucf.edu/facultybib2010/2890/},
year = {2012},
date = {2012-01-01},
urldate = {2012-01-01},
journal = {Journal of Laser Micro Nanoengineering},
volume = {7},
number = {3},
pages = {293},
abstract = {A process is reported that enables fabrication of truly three-dimensional micro-photonic structures directly onto the end face of an optical fiber by multi-photon direct laser writing in the cross-linkable epoxide SU-8. Solvent-free SU-8 resin is first obtained by heating in vacuo to remove volatiles. The resulting resin solids are then melt-reflowed around an optical fiber in a mold integrated into a sample mount. The resin is allowed to cool and solidify around the optical fiber, so the entire sample mount can be affixed to an optical system for direct laser writing. Using this approach a wide range of refractive and diffractive micro-optical structures can be integrated onto optical fibers that would be difficult, if not impossible, to create by other existing methods. Optical characterization of lens-tipped fibers shows that the approach can be used control the propagation of beams exiting from functionalized fibers, and the performance is reproducible across repeated fabrication of the same device. This work illustrates a new path to fiber-based integrated photonic devices.},
keywords = {Applied, laser materials processing, micro-optics, microstructure fabrication, Multidisciplinary Optics Physics, nanophotonics, photonic crystals, SU-8},
pubstate = {published},
tppubtype = {article}
}
A process is reported that enables fabrication of truly three-dimensional micro-photonic structures directly onto the end face of an optical fiber by multi-photon direct laser writing in the cross-linkable epoxide SU-8. Solvent-free SU-8 resin is first obtained by heating in vacuo to remove volatiles. The resulting resin solids are then melt-reflowed around an optical fiber in a mold integrated into a sample mount. The resin is allowed to cool and solidify around the optical fiber, so the entire sample mount can be affixed to an optical system for direct laser writing. Using this approach a wide range of refractive and diffractive micro-optical structures can be integrated onto optical fibers that would be difficult, if not impossible, to create by other existing methods. Optical characterization of lens-tipped fibers shows that the approach can be used control the propagation of beams exiting from functionalized fibers, and the performance is reproducible across repeated fabrication of the same device. This work illustrates a new path to fiber-based integrated photonic devices.
2004
Rumpf, Raymond C; Johnson, Eric G
Microphotonic systems utilizing SU-8 Proceedings Article
In: MOEMS and Miniaturized Systems IV, pp. 64-72, International Society for Optics and Photonics, 2004.
Abstract | Links | BibTeX | Tags: lithography, photoresist, SU-8
@inproceedings{RN33,
title = {Microphotonic systems utilizing SU-8},
author = {Raymond C Rumpf and Eric G Johnson},
url = {https://www.spiedigitallibrary.org/conference-proceedings-of-spie/5346/1/Microphotonic-systems-utilizing-SU-8/10.1117/12.533352.short},
doi = {https://doi.org/10.1117/12.533352},
year = {2004},
date = {2004-01-24},
booktitle = {MOEMS and Miniaturized Systems IV},
volume = {5346},
pages = {64-72},
publisher = {International Society for Optics and Photonics},
abstract = {SU-8 is a negative-tone photoresist that can serve as a complete optical bench for micro-photonic systems. Functional optical devices and passive alignment structures can all be formed in the same material system with common processing steps. Many interrelated process parameters control the final geometry of structures formed in SU-8, but all can be accurately simulated and predicted by computer modeling. In this work, a comprehensive model of the lithography process was developed and combined with rigorous electromagnetic simulation. It was applied to predict sidewall slope of a tall structures as well as the geometry and transmission spectra of a three-dimensional photonic crystal. The model is seen as an enabling step toward realizing optimized micro-photonic systems in SU-8.},
keywords = {lithography, photoresist, SU-8},
pubstate = {published},
tppubtype = {inproceedings}
}
SU-8 is a negative-tone photoresist that can serve as a complete optical bench for micro-photonic systems. Functional optical devices and passive alignment structures can all be formed in the same material system with common processing steps. Many interrelated process parameters control the final geometry of structures formed in SU-8, but all can be accurately simulated and predicted by computer modeling. In this work, a comprehensive model of the lithography process was developed and combined with rigorous electromagnetic simulation. It was applied to predict sidewall slope of a tall structures as well as the geometry and transmission spectra of a three-dimensional photonic crystal. The model is seen as an enabling step toward realizing optimized micro-photonic systems in SU-8.