2009
Poutous, Menelaos K; Roth, Zach; Buhl, Kaia; Pung, Aaron; Rumpf, Raymond C; Johnson, Eric G
Correlation of fabrication tolerances with the performance of guided-mode-resonance micro-optical components Presentation
24.02.2009.
Abstract | Links | BibTeX | Tags: GMR, guided mode resonance (GMR), lithography, numerical simulation, reflectivity
@misc{RN34,
title = {Correlation of fabrication tolerances with the performance of guided-mode-resonance micro-optical components},
author = {Menelaos K Poutous and Zach Roth and Kaia Buhl and Aaron Pung and Raymond C Rumpf and Eric G Johnson},
url = {https://www.spiedigitallibrary.org/conference-proceedings-of-spie/7205/1/Correlation-of-fabrication-tolerances-with-the-performance-of-guided-mode/10.1117/12.814514.short},
doi = {https://doi.org/10.1117/12.814514},
year = {2009},
date = {2009-02-24},
booktitle = {Advanced Fabrication Technologies for Micro/Nano Optics and Photonics II},
volume = {7205},
pages = {72050Y},
publisher = {International Society for Optics and Photonics},
abstract = {Large-scale fabrication of micro-optical Guided-Mode-Resonance (GMR) components using VLSI techniques is desirable, due to the planar system integration capabilities it enables, especially with laser resonator technology. However, GMR performance is dependent on within-wafer as well as wafer-to-wafer lithographic process variability, and pattern transfer fidelity of the final component in the substrate. The fabrication of lithographs below the g-line stepper resolution limit is addressed using multiple patterning. We report results from computational simulations, fabrication and optical reflectance measurements of GMR mirrors and filters (designed to perform around the wavelength of 1550nm), with correlations to lithographic parameter variability, such as photoresist exposure range and etch depth. The dependence of the GMR resonance peak wavelength, peak bandwidth are analyzed as a function of photolithographic fabrication tolerances and process window.},
keywords = {GMR, guided mode resonance (GMR), lithography, numerical simulation, reflectivity},
pubstate = {published},
tppubtype = {presentation}
}
Large-scale fabrication of micro-optical Guided-Mode-Resonance (GMR) components using VLSI techniques is desirable, due to the planar system integration capabilities it enables, especially with laser resonator technology. However, GMR performance is dependent on within-wafer as well as wafer-to-wafer lithographic process variability, and pattern transfer fidelity of the final component in the substrate. The fabrication of lithographs below the g-line stepper resolution limit is addressed using multiple patterning. We report results from computational simulations, fabrication and optical reflectance measurements of GMR mirrors and filters (designed to perform around the wavelength of 1550nm), with correlations to lithographic parameter variability, such as photoresist exposure range and etch depth. The dependence of the GMR resonance peak wavelength, peak bandwidth are analyzed as a function of photolithographic fabrication tolerances and process window.
2004
Rumpf, Raymond C; Johnson, Eric G
Microphotonic systems utilizing SU-8 Proceedings Article
In: MOEMS and Miniaturized Systems IV, pp. 64-72, International Society for Optics and Photonics, 2004.
Abstract | Links | BibTeX | Tags: lithography, photoresist, SU-8
@inproceedings{RN33,
title = {Microphotonic systems utilizing SU-8},
author = {Raymond C Rumpf and Eric G Johnson},
url = {https://www.spiedigitallibrary.org/conference-proceedings-of-spie/5346/1/Microphotonic-systems-utilizing-SU-8/10.1117/12.533352.short},
doi = {https://doi.org/10.1117/12.533352},
year = {2004},
date = {2004-01-24},
booktitle = {MOEMS and Miniaturized Systems IV},
volume = {5346},
pages = {64-72},
publisher = {International Society for Optics and Photonics},
abstract = {SU-8 is a negative-tone photoresist that can serve as a complete optical bench for micro-photonic systems. Functional optical devices and passive alignment structures can all be formed in the same material system with common processing steps. Many interrelated process parameters control the final geometry of structures formed in SU-8, but all can be accurately simulated and predicted by computer modeling. In this work, a comprehensive model of the lithography process was developed and combined with rigorous electromagnetic simulation. It was applied to predict sidewall slope of a tall structures as well as the geometry and transmission spectra of a three-dimensional photonic crystal. The model is seen as an enabling step toward realizing optimized micro-photonic systems in SU-8.},
keywords = {lithography, photoresist, SU-8},
pubstate = {published},
tppubtype = {inproceedings}
}
SU-8 is a negative-tone photoresist that can serve as a complete optical bench for micro-photonic systems. Functional optical devices and passive alignment structures can all be formed in the same material system with common processing steps. Many interrelated process parameters control the final geometry of structures formed in SU-8, but all can be accurately simulated and predicted by computer modeling. In this work, a comprehensive model of the lithography process was developed and combined with rigorous electromagnetic simulation. It was applied to predict sidewall slope of a tall structures as well as the geometry and transmission spectra of a three-dimensional photonic crystal. The model is seen as an enabling step toward realizing optimized micro-photonic systems in SU-8.