2020
Khorrami, Yaser; Fathi, Davood; Rumpf, Raymond C.
Guided-mode resonance filter optimal inverse design using one-and two-dimensional grating Journal Article
In: Journal of the Optical Society of America B, vol. 37, no. 2, pp. 425-432, 2020.
Abstract | Links | BibTeX | Tags: diffraction gratings, guided mode resonance (GMR), inverse design
@article{nokey,
title = {Guided-mode resonance filter optimal inverse design using one-and two-dimensional grating},
author = {Yaser Khorrami and Davood Fathi and Raymond C. Rumpf},
url = {https://www.osapublishing.org/josab/abstract.cfm?uri=josab-37-2-425},
doi = {10.1364/JOSAB.380094},
year = {2020},
date = {2020-01-23},
urldate = {2020-01-23},
journal = {Journal of the Optical Society of America B},
volume = {37},
number = {2},
pages = {425-432},
abstract = {We propose an optimized method for the inverse design of guided-mode resonance (GMR) filters using one- and two-dimensional (1D and 2D) grating structures. This work for 2D state is based on developing the effective permittivity of 1D grating structures along three orthogonal axes to predict the physical dimensions of the structure, for the first time to our knowledge. Also, we compare three optimization methods to reach the optimized conditions based on the characteristics of multilayer structures. Both the transfer matrix method and rigorous coupled-wave analysis are used to simulate and show the reflection and transmission of the proposed 2D GMR filters. The results show that insensitivity to polarization, the best accuracy in resonance location design, and a high quality factor can be achieved for both the rectangular and cylindrical structures as the ideal 2D GMR filters. Also, the effect of each layer thickness on the resonance location and the full width at half-maximum is illustrated. Finally, we investigate three different reasons for decreasing the FWHM of the output reflection of the GMR filters.},
keywords = {diffraction gratings, guided mode resonance (GMR), inverse design},
pubstate = {published},
tppubtype = {article}
}
We propose an optimized method for the inverse design of guided-mode resonance (GMR) filters using one- and two-dimensional (1D and 2D) grating structures. This work for 2D state is based on developing the effective permittivity of 1D grating structures along three orthogonal axes to predict the physical dimensions of the structure, for the first time to our knowledge. Also, we compare three optimization methods to reach the optimized conditions based on the characteristics of multilayer structures. Both the transfer matrix method and rigorous coupled-wave analysis are used to simulate and show the reflection and transmission of the proposed 2D GMR filters. The results show that insensitivity to polarization, the best accuracy in resonance location design, and a high quality factor can be achieved for both the rectangular and cylindrical structures as the ideal 2D GMR filters. Also, the effect of each layer thickness on the resonance location and the full width at half-maximum is illustrated. Finally, we investigate three different reasons for decreasing the FWHM of the output reflection of the GMR filters.
2012
Barton, Jay H; Rumpf, Raymond C; Smith, Randall W; Kozikowski, Carrie L; Zellner, Phillip A
All-dielectric frequency selective surfaces with few number of periods Journal Article
In: Progress In Electromagnetics Research B, vol. 41, pp. 269-283, 2012, ISSN: 1937-6472.
Abstract | Links | BibTeX | Tags: frequency selective surface (FSS), frequency selective surface (FSS), GMR, guided mode resonance (GMR)
@article{RN71,
title = {All-dielectric frequency selective surfaces with few number of periods},
author = {Jay H Barton and Raymond C Rumpf and Randall W Smith and Carrie L Kozikowski and Phillip A Zellner},
url = {https://www.jpier.org/pierb/pier.php?paper=12042404},
doi = {10.2528/PIERB12042404},
issn = {1937-6472},
year = {2012},
date = {2012-06-11},
urldate = {2012-06-11},
journal = {Progress In Electromagnetics Research B},
volume = {41},
pages = {269-283},
abstract = {All-dielectric frequency selective surfaces (FSSs) can serve as an alternative to their metallic counterparts when they must operate at very high power, loss must be minimized, or when the surface itself must be low observable. When metals are avoided, there is a weaker interaction with electromagnetic waves and it becomes more difficult to achieve strong suppression in the stop band while also realizing compact size, wide field-of-view or broadband operation. One attractive approach utilizes guided-mode resonance (GMR) as the filtering mechanism, but this phenomenon exhibits several drawbacks that must be overcome for practical application at radio frequencies. This paper introduces the concept of guide-mode resonance for FSSs and describes how they can be made to operate with a dramatically fewer number of periods than conventional GMR devices.},
keywords = {frequency selective surface (FSS), frequency selective surface (FSS), GMR, guided mode resonance (GMR)},
pubstate = {published},
tppubtype = {article}
}
All-dielectric frequency selective surfaces (FSSs) can serve as an alternative to their metallic counterparts when they must operate at very high power, loss must be minimized, or when the surface itself must be low observable. When metals are avoided, there is a weaker interaction with electromagnetic waves and it becomes more difficult to achieve strong suppression in the stop band while also realizing compact size, wide field-of-view or broadband operation. One attractive approach utilizes guided-mode resonance (GMR) as the filtering mechanism, but this phenomenon exhibits several drawbacks that must be overcome for practical application at radio frequencies. This paper introduces the concept of guide-mode resonance for FSSs and describes how they can be made to operate with a dramatically fewer number of periods than conventional GMR devices.
Pung, Aaron J; Poutous, Menelaos K; Rumpf, Raymond C; Roth, Zachary A; Johnson, Eric G
Fabrication of optically monolithic, low-index guided mode resonance filters Proceeding
International Society for Optics and Photonics, vol. 8249, 2012.
Abstract | Links | BibTeX | Tags: etching, guided mode resonance (GMR), spectral based filter, waveguide
@proceedings{RN61,
title = {Fabrication of optically monolithic, low-index guided mode resonance filters},
author = {Aaron J Pung and Menelaos K Poutous and Raymond C Rumpf and Zachary A Roth and Eric G Johnson},
url = {https://www.spiedigitallibrary.org/conference-proceedings-of-spie/8249/1/Fabrication-of-optically-monolithic-low-index-guided-mode-resonance-filters/10.1117/12.908582.short},
doi = {https://doi.org/10.1117/12.908582},
year = {2012},
date = {2012-02-08},
booktitle = {Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V},
volume = {8249},
pages = {82490F},
publisher = {International Society for Optics and Photonics},
abstract = {This paper presents a narrow spectral filter based on a monolithic material system. Guided-mode resonance is achieved by embedding a periodic array of air holes within a similar-index material. Microvoids created in the lowindex substrate during deposition of the waveguide give a relatively high index contrast for guided-mode resonance. One and two-dimensional gratings are used to examine polarization dependence of the device. Theoretical and experimental results are provided, demonstrating a roughly six nanometer resonance at the full width half-maximum for both geometries.},
keywords = {etching, guided mode resonance (GMR), spectral based filter, waveguide},
pubstate = {published},
tppubtype = {proceedings}
}
This paper presents a narrow spectral filter based on a monolithic material system. Guided-mode resonance is achieved by embedding a periodic array of air holes within a similar-index material. Microvoids created in the lowindex substrate during deposition of the waveguide give a relatively high index contrast for guided-mode resonance. One and two-dimensional gratings are used to examine polarization dependence of the device. Theoretical and experimental results are provided, demonstrating a roughly six nanometer resonance at the full width half-maximum for both geometries.
2009
Poutous, Menelaos K; Roth, Zach; Buhl, Kaia; Pung, Aaron; Rumpf, Raymond C; Johnson, Eric G
Correlation of fabrication tolerances with the performance of guided-mode-resonance micro-optical components Presentation
24.02.2009.
Abstract | Links | BibTeX | Tags: GMR, guided mode resonance (GMR), lithography, numerical simulation, reflectivity
@misc{RN34,
title = {Correlation of fabrication tolerances with the performance of guided-mode-resonance micro-optical components},
author = {Menelaos K Poutous and Zach Roth and Kaia Buhl and Aaron Pung and Raymond C Rumpf and Eric G Johnson},
url = {https://www.spiedigitallibrary.org/conference-proceedings-of-spie/7205/1/Correlation-of-fabrication-tolerances-with-the-performance-of-guided-mode/10.1117/12.814514.short},
doi = {https://doi.org/10.1117/12.814514},
year = {2009},
date = {2009-02-24},
booktitle = {Advanced Fabrication Technologies for Micro/Nano Optics and Photonics II},
volume = {7205},
pages = {72050Y},
publisher = {International Society for Optics and Photonics},
abstract = {Large-scale fabrication of micro-optical Guided-Mode-Resonance (GMR) components using VLSI techniques is desirable, due to the planar system integration capabilities it enables, especially with laser resonator technology. However, GMR performance is dependent on within-wafer as well as wafer-to-wafer lithographic process variability, and pattern transfer fidelity of the final component in the substrate. The fabrication of lithographs below the g-line stepper resolution limit is addressed using multiple patterning. We report results from computational simulations, fabrication and optical reflectance measurements of GMR mirrors and filters (designed to perform around the wavelength of 1550nm), with correlations to lithographic parameter variability, such as photoresist exposure range and etch depth. The dependence of the GMR resonance peak wavelength, peak bandwidth are analyzed as a function of photolithographic fabrication tolerances and process window.},
keywords = {GMR, guided mode resonance (GMR), lithography, numerical simulation, reflectivity},
pubstate = {published},
tppubtype = {presentation}
}
Large-scale fabrication of micro-optical Guided-Mode-Resonance (GMR) components using VLSI techniques is desirable, due to the planar system integration capabilities it enables, especially with laser resonator technology. However, GMR performance is dependent on within-wafer as well as wafer-to-wafer lithographic process variability, and pattern transfer fidelity of the final component in the substrate. The fabrication of lithographs below the g-line stepper resolution limit is addressed using multiple patterning. We report results from computational simulations, fabrication and optical reflectance measurements of GMR mirrors and filters (designed to perform around the wavelength of 1550nm), with correlations to lithographic parameter variability, such as photoresist exposure range and etch depth. The dependence of the GMR resonance peak wavelength, peak bandwidth are analyzed as a function of photolithographic fabrication tolerances and process window.
2007
Rumpf, Raymond C; Johnson, Eric G
Modeling fabrication to accurately place GMR resonances Journal Article
In: Optics Express, vol. 15, no. 6, pp. 3452-3464, 2007, ISSN: 1094-4087.
Abstract | Links | BibTeX | Tags: depostion processes, electromagnetic modeling, etching, GMR, guided mode resonance (GMR), numerical simulation, thin film resistors
@article{RN29,
title = {Modeling fabrication to accurately place GMR resonances},
author = {Raymond C Rumpf and Eric G Johnson},
url = {https://www.osapublishing.org/oe/fulltext.cfm?uri=oe-15-6-3452&id=131206},
doi = {https://doi.org/10.1364/OE.15.003452},
issn = {1094-4087},
year = {2007},
date = {2007-04-01},
journal = {Optics Express},
volume = {15},
number = {6},
pages = {3452-3464},
abstract = {Numerical methods for simulating etching and deposition processes were combined with electromagnetic modeling to design guided-mode resonance (GMR) filters with accurately positioned resonances and study how fabrication affects their optical behavior. GMR filters are highly sensitive to structural deformations that arise during fabrication, making accurate placement of their resonances very difficult without active tuning while in operation. Inspired by how thin film resistors are trimmed during fabrication, the numerical tools were used to design a method for adjusting position of GMR resonances at the time of fabrication.},
keywords = {depostion processes, electromagnetic modeling, etching, GMR, guided mode resonance (GMR), numerical simulation, thin film resistors},
pubstate = {published},
tppubtype = {article}
}
Numerical methods for simulating etching and deposition processes were combined with electromagnetic modeling to design guided-mode resonance (GMR) filters with accurately positioned resonances and study how fabrication affects their optical behavior. GMR filters are highly sensitive to structural deformations that arise during fabrication, making accurate placement of their resonances very difficult without active tuning while in operation. Inspired by how thin film resistors are trimmed during fabrication, the numerical tools were used to design a method for adjusting position of GMR resonances at the time of fabrication.