Publications

@proceedings{RN61,

title = {Fabrication of optically monolithic, low-index guided mode resonance filters},

author = {Aaron J Pung and Menelaos K Poutous and Raymond C Rumpf and Zachary A Roth and Eric G Johnson},

url = {https://www.spiedigitallibrary.org/conference-proceedings-of-spie/8249/1/Fabrication-of-optically-monolithic-low-index-guided-mode-resonance-filters/10.1117/12.908582.short},

doi = {https://doi.org/10.1117/12.908582},

year  = {2012},

date = {2012-02-08},

booktitle = {Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V},

volume = {8249},

pages = {82490F},

publisher = {International Society for Optics and Photonics},

abstract = {This paper presents a narrow spectral filter based on a monolithic material system. Guided-mode resonance is achieved by embedding a periodic array of air holes within a similar-index material. Microvoids created in the lowindex substrate during deposition of the waveguide give a relatively high index contrast for guided-mode resonance. One and two-dimensional gratings are used to examine polarization dependence of the device. Theoretical and experimental results are provided, demonstrating a roughly six nanometer resonance at the full width half-maximum for both geometries.},

keywords = {etching, guided mode resonance (GMR), spectral based filter, waveguide},

pubstate = {published},

tppubtype = {proceedings}

}

@proceedings{RN49,

title = {Fabrication of 3D photonic crystals by two-step dry etching of layered media},

author = {Pradeep Srinivasan and Raymond C Rumpf and Eric G Johnson},

url = {https://www.spiedigitallibrary.org/conference-proceedings-of-spie/6110/1/Fabrication-of-3D-photonic-crystals-by-two-step-dry-etching/10.1117/12.646461.short?SSO=1},

doi = {https://doi.org/10.1117/12.646461},

year  = {2006},

date = {2006-01-23},

booktitle = {Micromachining Technology for Micro-Optics and Nano-Optics IV},

volume = {6110},

pages = {611006},

publisher = {International Society for Optics and Photonics},

abstract = {Photonic crystals have received growing interest over the past decade on account of their excellent functionality to guiding and manipulating electromagnetic radiation and their diverse applications. Our approach to fabricate crystals is by a two step etching process in a semiconductor hetero-structure of gallium arsenide (GaAs) and aluminum gallium arsenide (AlGaAs) grown using molecular beam epitaxy (MBE). An array of holes was dry etched in Cl 2 /Ar inductively coupled plasma. Etching selectivity between the mask and the substrate was 10:1.2 By using SF 6  in addition to the boron-tri-chloride (BCl 3 ) chemistry, the GaAs is etched selectively over the AlGaAs with selectivities over 5:1. Thus a robust two-step etching process has been developed based entirely on dry etching},

keywords = {etching, photonic crystals},

pubstate = {published},

tppubtype = {proceedings}

}